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Analytical Model for RDF-Induced Threshold Voltage Fluctuations in Double-Gate MOSFET
Sriram S.R,
Published in Institute of Electrical and Electronics Engineers (IEEE)
2019
Volume: 19
   
Issue: 2
Pages: 370 - 377
Abstract
In this paper, a physics-based threshold voltage model of symmetrical double gate (DG) MOSFET, including the random dopants in the channel is presented. The model is derived from the solution of 2-D Poisson's equation and is suitable for circuit simulation. The average potential considering random dopants in the channel is used to calculate the threshold voltage and provides accurate results. The developed threshold voltage model is validated with TCAD simulations for different device dimensions and doping concentrations. The standard deviation ( {\sigma } {\text{V}}-{\text{TH}} ) is calculated from a threshold voltage distribution of 200 devices. The proposed model is useful to simulate variations in a large number of devices with randomly placed dopants, with less computational time. The model is integrated in the Cadence circuit simulator and analyzed the effect of random dopant fluctuation-induced {\text{V}}-{\text{TH}} variations of n-channel DG MOSFET in the inverter circuit. © 2001-2011 IEEE.
About the journal
JournalData powered by TypesetIEEE Transactions on Device and Materials Reliability
PublisherData powered by TypesetInstitute of Electrical and Electronics Engineers (IEEE)
ISSN1530-4388
Open AccessNo