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Development and vapour pressure of metallo-organic precursors of copper for the deposition of copper thin films by a plasma-assisted MOCVD
M g johnson, Johnson M.G, S raj bharath, Raj Bharath S, S arockiasamy, Arockiasamy S, T maiyalagan, Maiyalagan T, J selvakumar, Selvakumar JShow More
Published in Informa UK Limited
Volume: 47
Issue: 12
Pages: 1635 - 1642
About the journal
JournalInorganic and Nano-Metal Chemistry
PublisherInforma UK Limited
Open Access0