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Effect of doping profile on tunneling field effect transistor performancePublished in
2013
Pages: 195 - 198
Tunneling field effect transistor (TFETs) has recently attracted considerable interest because of their potential use in low power logic application. In this paper, we have investigated the effect of uniform doping versus varying doping (Gaussian) profile on TFET performance. We have shown that off-state current and subthreshold slope (SS) in the TFET can be improved by using low doping profile at channel-drain junction. It provides an improved ION/IoFF and subthreshold slope of 1010 and 47 mV/dec respectively. Also by placing small high density layer in the channel near source-channel junction improve the SS to 43 mV/dec and Ion current by a few order. Finally, it is shown that ambipolar behavior is also reduced. © 2013 IEEE.
Topics: Subthreshold slope (59)%59% related to the paper and Field-effect transistor (53)%53% related to the paper
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About the journal
| Journal | Proceedings of the 2013 Spanish Conference on Electron Devices, CDE 2013 |
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Authors (1)
Vikas Vijayvargiya- Dataline isolated differential current feed/mode sense amplifier for small Icell SRAM using FinFET
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