NiO-Ag thin films were deposited on Corning 7059 glass substrates by DC reactive magnetron sputtering technique and investigated the substrate temperature (Ts) dependent properties of NiO-Ag thin films. X-ray diffraction results showed that crystalline films can be obtained at high Ts and all films have a preferred crystal growth texture with face centered cubic (fcc) structure and was also confirmed by Raman studies. The grain size, transmittance, band gap, mobility and carrier concentrations were increased with Ts. Room temperature deposited films have an average roughness around 6.9 nm where as increment of Ts resulted in increased roughness up to 14 nm with nanocrystalline morphology. The optimum substrate temperature to obtain NiO-Ag films was found to be 200°C. It was found that with increasing the Ts, resistivity of the films was significantly decreased. © 2014, The Korean Institute of Metals and Materials and Springer Science+Business Media Dordrecht.