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Proceedings Article
Numerical simulation of dry and wet oxidation of Silicon by TCAD SprocessPublished in IEEE
2013
Topics: Thermal oxidation (66)%66% related to the paper, Oxide (62)%62% related to the paper, Wet oxidation (61)%61% related to the paper, LOCOS (59)%59% related to the paper and Substrate (electronics) (54)%54% related to the paper
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| Journal | Data powered by TypesetInternational Conference on Advanced Nanomaterials & Emerging Engineering Technologies |
|---|---|
| Publisher | Data powered by TypesetIEEE |
| Open Access | 0 |
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