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Optical characterization of GaN by N+ implantation into GaAs at elevated temperature
S. Dhara, P. Magudapathy, R. Kesavamoorthy, S. Kalavathi, K.G.M. Nair, G.M. Hsu, L.C. Chen, K.H. Chen, , T. Soga
Published in
2005
Volume: 87
   
Issue: 26
Pages: 1 - 3
Abstract
Both hexagonal wurtzite and cubic zinc blend GaN phases were synthesized in GaAs by 50 keV N+ implantation at 400 °C and subsequent annealing at 900 °C for 15 min in N2 ambient. The crystallographic structural and Raman scattering studies revealed that GaN phases were grown for fluence above 2× 1017 cm-2. Temperature-dependent photoluminescence study showed a sharp direct band-to-band transition peak ∼3.32 eV at temperature ≤200 K. The intermediate band-gap value, with respect to ∼3.4 eV for hexagonal and ∼3.27 eV for cubic phases of GaN, is indicative of the formation of mixed hexagonal and cubic phases. © 2005 American Institute of Physics.
About the journal
JournalApplied Physics Letters
ISSN00036951