Performance enhancement of Silicon MEMS PZR accelerometer with electroplated gold on proofmass has been presented in this paper. Performance enhancement is achieved by depositing heavy electroplated gold mass of 20 μm thickness on top of proof mass of the device. The structures were simulated for acceleration of ± 10 g using a commercially available software package CoventorWare™ 2005. For 20 μm thick electroplated gold on whole area of proofmass, sensitivity along Z-axis is increased by 60.6% as compared to the structure without gold. For 10 g acceleration off-axis sensitivities along X and Y-axes are reduced by 38.3% and 18.96% respectively. A commercially available sulphite based solution TSG-250™ was used for electroplating. Both the accelerometer structures have been successfully fabricated. Dual doped TMAH solution was used for wet anisotropic etching. Thus the fabrication process is CMOS compatible. ©2007 IEEE.