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PHOTOACOUSTIC STUDIES ON TiAlN NANOSTRUCTURED THIN FILMS
, Irudayaraj A.A, Kuppusami P, Mohandas E, , Ramachandran K.
Published in World Scientific Pub Co Pte Lt
2007
Volume: 21
   
Issue: 22
Pages: 3889 - 3900
Abstract
Nanostructured titanium aluminium nitride ( TiAlN ) thin films were prepared on Si (111) substrate by reactive DC magnetron sputtering technique for various N 2 flow rates. X-ray diffraction showed that the films are nanocrystalline and the grain size decreases from 14 nm to 5 nm as the N 2 flow rate is increased. The thermal properties are then studied by photoacoustic (PA) spectroscopy. The study revealed an increase in thermal diffusivity and conductivity with increasing N 2 flow rates, and the measured values of the thermal properties are significantly lower than those obtained with bulk materials which constitute TiAlN .
About the journal
JournalInternational Journal of Modern Physics B
PublisherWorld Scientific Pub Co Pte Lt
ISSN0217-9792
Open Access0