Hexagonal phase InN was synthesized by 50 keV nitrogen ion implantation at 400 °C on an (100) InP single crystal substrate. The implanted samples were characterised using glancing incidence X-ray diffraction (GIXRD) and Raman spectroscopy. At low implantation dose the metallic In is observed to form due to the implantation-induced decomposition of the InP at 400 °C. As the implantation dose is increased complete nitradation takes place resulting in the disappearance of the metallic indium and formation of InN phase. © 2003 Elsevier B.V. All rights reserved.