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Synthesis of InN by N+ implantation on InP at high temperature
, R. Kesavamoorthy, K.G.M. Nair, P. Jayavel, D. Kanjilal, V. Sankara Sastry, V. Ravichandran
Published in
2003
Volume: 212
   
Issue: 1-4
Pages: 521 - 524
Abstract
Hexagonal phase InN was synthesized by 50 keV nitrogen ion implantation at 400 °C on an (100) InP single crystal substrate. The implanted samples were characterised using glancing incidence X-ray diffraction (GIXRD) and Raman spectroscopy. At low implantation dose the metallic In is observed to form due to the implantation-induced decomposition of the InP at 400 °C. As the implantation dose is increased complete nitradation takes place resulting in the disappearance of the metallic indium and formation of InN phase. © 2003 Elsevier B.V. All rights reserved.
About the journal
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
ISSN0168583X