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Dependence of deposition parameters and layer thickness on the characteristics of Nd-Fe-B thin films
, R. Tokumaru, S. Tamano, S. Goto, K. Tokiwa, T. Watanabe
Published in Institute of Physics Publishing
2009
Volume: 191
   
Abstract
Textured Nd-Fe-B thin films with hard magnetic properties were prepared on a Ta (110) buffer layered glass substrates using radio frequency (RF) sputtering deposition. We investigated the influence of substrate temperature, sputtering gas pressure, RF power and film thickness on their microstructural and magnetic properties. Composition in the Nd-Fe-B thin films prepared using the same target with an Nd/Fe ratio of 0.32 was markedly changed (varied between 0.21 and 0.31) depending on the Ar pressure and the RF power. Well-textured Nd-Fe-B films grown at a deposition pressure of 7.0 Pa, a temperature of 550 °C, and a power of 100 W revealed better magnetic properties: Jr1.1 T, H c 1130 kA/m and BH(max) 236 kJ/m3. © 2009 IOP Publishing Ltd.
About the journal
JournalJournal of Physics: Conference Series
PublisherInstitute of Physics Publishing
ISSN17426588