Kalainathan S

Department of Physics

School of Advanced Sciences

Vellore Campus

Irudayaraj A.A

Kuppusami P

Thirumurugesan R

Mohandas E

Raghunathan V.S.

Vellore Institute of Technology (VIT) is a private university located in&nbsp;Tamil Nadu, India. Founded in 1984, as Vellore Engineering College, the institution offers 20 undergraduate, 34 postgraduate, four integrated and four research programs. It has campuses in Vellore, Amravati, Bhopal and Chennai.

VIT is one of the top ranked private universities in India according to NIRF, THE and QS Rankings.&nbsp;Govt. of India has recognized&nbsp;VIT, Vellore as an&nbsp;Institution of Eminence. This has allowed VIT to take independent quality initiatives and move up in world ranking.

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VIT University

Influence of nitrogen flow rate on growth of TiAlN films prepared by DC magnetron sputtering

Surface Engineering

Structural properties and electrical resistivity of TiNxand Ti1−xAlxN films prepared by reactive dc magnetron sputtering: effect of nitrogen flowrate

Nanostructured titanium aluminium nitride ( TiAlN ) thin films were prepared on Si (111) substrate by reactive DC magnetron sputtering technique for various N 2 flow rates. X-ray diffraction showed that the films are nanocrystalline and the grain size decreases from 14 nm to 5 nm as the N 2 flow rate is increased. The thermal properties are then studied by photoacoustic (PA) spectroscopy. The study revealed an increase in thermal diffusivity and conductivity with increasing N 2 flow rates, and the measured values of the thermal properties are significantly lower than those obtained with bulk materials which constitute TiAlN .

International Journal of Modern Physics B

PHOTOACOUSTIC STUDIES ON TiAlN NANOSTRUCTURED THIN FILMS

Surface and Coatings Technology

Influence of bias variation on residual stress and texture in TiAlN PVD coatings

Materials Letters

Effect of N2 partial pressure on the microstructure and mechanical properties of reactively sputtered (Ti,Al)N coatings

Properties of TiAlN coatings synthesized by closed-field unbalanced magnetron sputtering

Journal of Alloys and Compounds

X-ray diffraction on nanocrystalline Ti1−xAlxN thin films

Structural and mechanical properties of titanium–aluminium–nitride films deposited by reactive close-field unbalanced magnetron sputtering

Journal	Surface Engineering
Publisher	Informa UK Limited
ISSN	0267-0844
Open Access	0