This article presents a realistic inter-carbon nanotube (CNT) electrostatic coupling capacitance and tunnelling conductance model for a mixed CNT bundle. The change of potential across such a bundle necessitates the need to consider the inter-CNT capacitance in the equivalent circuit of CNT interconnects for very large scale integration circuits. The equivalent transmission line circuit model of a unit bundle containing one single-walled CNT (SWCNT) and one multi-walled CNT (MWCNT) has been shown. This new model is then used to calculate the delay induced by the inter-CNT capacitance and tunnelling conductance, which predicts the relative positioning of MW/SWCNTs in mixed CNT bundle.

Uma Sathyakam P

Department of Instrumentation

School of Electrical Engineering

Vellore Campus

Partha Sharathi Mallick

Vellore Institute of Technology (VIT) is a private university located in&nbsp;Tamil Nadu, India. Founded in 1984, as Vellore Engineering College, the institution offers 20 undergraduate, 34 postgraduate, four integrated and four research programs. It has campuses in Vellore, Amravati, Bhopal and Chennai.

VIT is one of the top ranked private universities in India according to NIRF, THE and QS Rankings.&nbsp;Govt. of India has recognized&nbsp;VIT, Vellore as an&nbsp;Institution of Eminence. This has allowed VIT to take independent quality initiatives and move up in world ranking.

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VIT University

Inter-CNT capacitance in mixed CNT bundle interconnects for VLSI circuits

International Journal of Electronics

Triangular carbon nanotube (T-CNT) bundles are proposed as long interconnects for subthreshold VLSI circuits. The performance of subthreshold interconnects depends on the intrinsic quantum and electrostatic coupling capacitances of the interconnects. Proposed T-CNT bundles have the most optimum geometry that give least possible coupling capacitance between adjacent wires in an IC. First, we describe the T-CNT bundle models and of traditionally used square/rectangular CNT bundles for comparison. The subthreshold output current of an inverter is modelled, and hence, we find the optimum transistor widths for nFET and pFET that drives the subthreshold interconnects. This is carried out by the current-over-capacitance ratio approach, where the subthreshold current and the transistor output capacitance are considered. Then, we model the interconnects using equivalent single conductor models and find their propagation delay and power dissipated. The performance factors such as crosstalk-induced delay, power delay product and victim noise levels of capacitive coupled interconnects of T-CNT bundles are compared to traditionally used square/rectangular CNT bundles for lengths ranging from 500&nbsp;μm to 2000&nbsp;μm. We find that T-CNT bundles outperform square/rectangular CNT bundles.

Fulltext

Journal of Electronic Materials

Triangular Carbon Nanotube Bundle Interconnects for Subthreshold VLSI Circuits

Carbon nanotube (CNT) interconnects are emerging as the ultimate choice for next generation ultra large scale integrated (ULSI) circuits. Significant progress in precise growth of aligned CNTs and integration of multiwalled CNT interconnects into a test chip make them promising candidates for future nanoelectronic chips. Tremendous research efforts were made on silicon based ultra-low-k dielectrics for Cu interconnects, but, the most recent advancements in polymer based composites as dielectric materials open up fresh challenges in the use of low-k dielectrics for CNT interconnects. This paper reviews the emerging polymer composites like Boron Nitride Nanotubes, Graphene/Polyimide composites, Metal Organic Frameworks and small diameter CNTs. Many reviews are already exists on the synthesis, fabrication, dielectric, mechanical, chemical and thermal properties of these materials. In this review, we have explained the specific properties of these materials and the necessities for integrating them into CNT interconnects to meet the requirements of future IC designers.Keywords: low-k dielectric materials, ultra low-k dielectrics, carbon nanotubes, interconnects, dielectric constant,

Journal of Nano Research

Future Dielectric Materials for CNT Interconnects - Possibilities and Challenges

Interconnects plays an important role in integrated circuits. Copper is used as an interconnect material, but beyond 22[Formula: see text]nm technology node it faces many problems due to grain boundary scattering, and therefore carbon nanotubes are the most promising future interconnect materials. Various techniques and approaches such as driver sizing, repeater sizing, repeater insertion, wire sizing, wire spacing, shielding, boos table repeater were used by various researchers. Many of these techniques can be utilized for future CNT based VLSI interconnects as well. This paper presents a detailed discussion on the techniques and approaches of past, present and future relevant for interconnects of VLSI circuits.

Journal of Circuits, Systems and Computers

Optimization Techniques for CNT Based VLSI Interconnects — A Review

The performance of coupled VLSI interconnects depends on their coupling capacitance and the dielectric medium surrounding them. However, the idea of designing the geometry of CNT bundles to optimize the coupling capacitance is not considered till now. So, in this paper, we model triangular CNT (T-CNT) bundles as VLSI interconnects, for the first time. Factors that reveal the performance of interconnects like propagation delay, crosstalk delay and power dissipated by the interconnects, are simulated in this paper. We do the performance analysis of T-CNT bundle interconnects and conventionally modeled square type CNT bundle interconnects. Upon comparison of the above said metrics, it was found that T-CNT bundle interconnects performed better.

2016 3rd International Conference on Emerging Electronics (ICEE)

Triangular CNT bundles as VLSI interconnects

In this letter, we present a new method to reduce crosstalk of carbon nanotube (CNT)-based VLSI interconnects. For this, proper integration of semiconducting CNTs (s-CNTs) and a new contact geometry, where metallic CNTs are in the core and s-CNTs are in the periphery of the CNT bundle, is proposed. The coupling capacitance between adjacent interconnects is modeled and compared with and without s-CNTs in the CNT bundle periphery. SPICE analysis and EM simulations are carried out which show that the coupling capacitance can be reduced by 82.5% and the resulting delay by 8.41%. We suggest that the crosstalk effect between neighboring wires can be reduced by using s-CNTs in the design.

IEEE Transactions on Nanotechnology

Role of Semiconducting Carbon Nanotubes in Crosstalk Reduction of CNT Interconnects

Presented for the first time is an accurate modelling hierarchy for mixed CNT bundle interconnects. Single-walled CNTs and multi-walled CNTs have been modelled as equivalent single conductor transmission lines and then combined to form a mixed CNT bundle interconnect, which is basically a multiple equivalent single conductor model. Two multiple equivalent single conductor interconnects have been taken to form the multiconductor transmission line model. The delays from transient analysis for both models for a unit bundle have been compared with the corresponding ones for SWCNT bundles and MWCNTs that exist in the literature. It is found that mixed CNT bundle interconnects are superior to both SWCNT bundle and MWCNT interconnects in terms of delay.

Journal	International Journal of Electronics
Publisher	Informa UK Limited
ISSN	0020-7217
Open Access	0