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Articles
Reorientation transition in ultrathin alloy filmsPublished in
2002
The reorientation transition in ultrathin alloy films were investigated by using low energy electron diffraction technique. The measurements of the Ni-rich alloys were performed at 300 K. The results showed that the reorientation thickness increased by a factor of ∼2 within a narrow concentration of 6%.
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About the journal
| Journal | Digests of the Intermag Conference |
|---|---|
| ISSN | 00746843 |
Authors (1)
Ramesh M Thamankar- Localized characterization of charge transport and random telegraph noise at the nanoscale in HfO2 films combining scanning tunneling microscopy and multi-scale simulations
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