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Large scale fabrication of asymmetric 2D and 3D micro/nano array pattern structures using multi-beam interference lithography technique for Solar cell texturing application
A.A. Kirubaraj, D.J. Moni,
Published in Springer Verlag
Volume: 24
Issue: 6
Pages: 2569 - 2575
A method for the large scale fabrication of nano/micro array patterned structure for solar Photovoltaics (PV) is demonstrated by the use of laser interference lithography (LIL) technique. Since micro/nano array patterned structures for photonic arrangement are of increasing importance in higher efficiency solar PV cell concepts, structuring technique and miniaturization in size play a vital role in their realization/fabrication. In this paper, we have designed and modelled multi-beam interference lithography technique (MBIL) for the fabrication of solar PV cells. The generated periodic 1D, 2D and 3D micro/nano array structures are done using MATLAB. The obtained results show that the complexity of the pattern structures varies with the variation in position of beams and angle of incidence. The interference parameters such as wavelength, slit separation, distance between slit and screen influence in generation of periodic array pattern structures. The maximum intensity occurs at an angle of incidence 45 degree. The obtained pattern structures have the periodicity of 0.19 µm for 1064 nm, 0.18 µm for 1024 nm, 0.14 µm for 780 nm, 0.12 µm for 650 nm and 0.07 µm for 565 nm. Depth of the focus is found to be 0.029 µm for 1064 nm, 0.028 µm for 1024 nm, 0.024 µm for 780 nm, 0.020 µm for 650 nm and 0.015 µm for 565 nm. MBIL can be applied in fabrication of 3D photonic crystals, magnetic storage, solar cells, waveguides, calibration grids, Organic Light Emitting Diodes (OLEDs) and functional surfaces of sensors. © 2018, Springer-Verlag GmbH Germany, part of Springer Nature.
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