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Nanostructured barrier type anodic oxide metal-insulator-metal capacitors
D. Kannadassan, R. Karthik, , M.S. Bhagini, , P.S. Mallick, Bhagini M.S,
Published in
2012
Volume: 7
   
Issue: 4
Pages: 400 - 404
Abstract
In this paper, we have presented a detailed study of electrical properties and fabrication of Metal-Insulator-Metal capacitor using anodization. Anodization is regarded as a potential fabrication process for the preparation of high quality metal-insulator-metal capacitors to meet the requirements of International Technology Roadmap for Semiconductors 2012 predicted for Mixed Signal/RF technologies. With high capacitance density of 6.01 fF/μm 2 and low voltage coefficient of capacitance less than 500 ppm/V, anodic oxide MIM capacitor shows that the capacitance varies by less than 6% in the frequency range of 1 KHz to 1 MHz at 3 V and low leakage current density of less than 1 nA/cm 2 at 2 V. Copyright © 2012 American Scientific Publishers All rights reserved.
About the journal
JournalJournal of Nanoelectronics and Optoelectronics
ISSN1555130X
Open AccessNo
Concepts (20)
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    ANODIC OXIDES
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    Anodizations
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    BARRIER TYPES
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    Dielectric polarization
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    Fabrication process
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    Frequency ranges
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    High quality
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    HIGH-CAPACITANCE DENSITY
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    High-k
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    INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS
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    Low voltages
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    Low-leakage current
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    Metal insulator metal capacitor (mim)
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    Mim capacitors
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    Mixed signal
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    Nano-structured
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    Anodic oxidation
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    Capacitance
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    Capacitors
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    Mim devices